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GAO Haoxuan, HUANG Tonghua, CHENG Nianbin, ZOU Jun, WU Peng, LIAO Yitao. Summary of the difference between SiC MOSFET drive mode and Si MOSFET drive modeJ. Journal of Technology, 2026, 26(2): 202-211. DOI: 10.3969/j.issn.2096-3424.2024.077
Citation: GAO Haoxuan, HUANG Tonghua, CHENG Nianbin, ZOU Jun, WU Peng, LIAO Yitao. Summary of the difference between SiC MOSFET drive mode and Si MOSFET drive modeJ. Journal of Technology, 2026, 26(2): 202-211. DOI: 10.3969/j.issn.2096-3424.2024.077

Summary of the difference between SiC MOSFET drive mode and Si MOSFET drive mode

  • Silicon carbide (SiC), a third-generation wide-bandgap semiconductor, is increasingly replacing silicon (Si) in the design of high-frequency, high-voltage, and high-power devices due to its superior material properties, such as a wider bandgap, higher breakdown electric field, faster saturated electron drift velocity, and better thermal conductivity. This paper systematically compares the differences in gate driving characteristics between silicon carbide metal-oxide-semiconductor field-effect transistor (SiC MOSFETs) and silicon metal-oxide-semiconductor field-effect transistor (Si MOSFETs), examining their key differences from five dimensions: material properties, driving voltage, switching speed, driving circuit, and power consumption. Furthermore, the Miller plateau phenomenon specific to SiC MOSFET driving is thoroughly analyzed, followed by a comprehensive discussion on the performance differences between SiC and Si materials.
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